2024年3月11日发(作者：钊稷)

专利内容由知识产权出版社提供

专利名称：Method for producing liquid crystal display

and method for cleaning substrate

发明人：Yoshiyuki Nagahara,Naoya Hayamizu,Naoaki

Sakurai,Noriko Okoshi,Toshitaka

Nonaka,Hiroaki Furuya

申请号：US09098984

申请日：19980617

公开号：US06210748B1

公开日：20010403

专利附图：

摘要：An electrode substrate is brush cleaned with a hydrogen gas dissolved water,

which has an oxidation-reduction potential of −860 mV to −400 mV and a pH of 8 to 12,

before applying an alignment layer material on the electrode substrate. Thus, it is

possible to decrease the manufacturing costs without decreasing the detergency.

申请人：KABUSHIKI KAISHA TOSHIBA

代理机构：Oblon, Spivak, McClelland, Maier & Neustadt, P.C.

更多信息请下载全文后查看

2024年3月11日发(作者：钊稷)

专利内容由知识产权出版社提供

专利名称：Method for producing liquid crystal display

and method for cleaning substrate

发明人：Yoshiyuki Nagahara,Naoya Hayamizu,Naoaki

Sakurai,Noriko Okoshi,Toshitaka

Nonaka,Hiroaki Furuya

申请号：US09098984

申请日：19980617

公开号：US06210748B1

公开日：20010403

专利附图：

摘要：An electrode substrate is brush cleaned with a hydrogen gas dissolved water,

which has an oxidation-reduction potential of −860 mV to −400 mV and a pH of 8 to 12,

before applying an alignment layer material on the electrode substrate. Thus, it is

possible to decrease the manufacturing costs without decreasing the detergency.

申请人：KABUSHIKI KAISHA TOSHIBA

代理机构：Oblon, Spivak, McClelland, Maier & Neustadt, P.C.

更多信息请下载全文后查看